Mechanical Characterization of High Aspect Ratio Silicon Nanolines
نویسندگان
چکیده
منابع مشابه
HIGH ASPECT RATIO SiLICON NANOFABRICATION (HARSiN)
A simplified process to fabricate high aspect ratio nanostructures in silicon combining electron beam lithography and deep reactive ion etching (DRIE) is presented. A stable process (HARSiN) has been developed without the need for complicated resist/hard mask processing or complex dry etch technologies. This is achieved using commercially available ZEP520A resist from Nippon Zeon Co., Ltd which...
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ژورنال
عنوان ژورنال: MRS Proceedings
سال: 2008
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-1086-u05-07